Remote Plasma Source

WPIC Torrent Series High-Performance Remote Plasma Sources feature a fully digital architecture and are designed to operate with existing RF generators, allowing adjustable output power to accommodate increasingly complex process requirements. By utilizing higher operating frequencies, the system delivers enhanced plasma spectral energy and dissociation efficiency for superior process performance.

The Torrent Series is ideally suited for wafer regeneration and chamber surface cleaning applications in semiconductor PECVD and PEALD processes. It significantly reduces both power consumption and process gas usage, helping customers improve sustainability and lower operating costs.

Available power configurations include 1 kW, 1.5 kW, and 2.5 kW, providing flexibility to meet a wide range of semiconductor manufacturing requirements.